Title :
A Silicon-Added Bilayer Resist (SABRE) Process for High-Resolution Optical Lithography
Author :
McColgin, W.C. ; Jech, J., Jr. ; Daly, R.C. ; Brust, T.B.
Author_Institution :
Microelectronics Technology Division, Electronics Research Laboratories, Eastman Kodak Company, Rochester, New York 14650
Keywords :
Etching; Floods; Lithography; Optical scattering; Optical sensors; Ovens; Planarization; Resists; Silicon; Temperature;
Conference_Titel :
VLSI Technology, 1987. Digest of Technical Papers. Symposium on
Conference_Location :
Karuizawa, Japan
