• DocumentCode
    472726
  • Title

    Variable Proximity Corrections for Submicron Optical Lithographic Masks

  • Author

    Nissan-Cohen, Y. ; Frank, P. ; Balch, E.W. ; Thompson, B. ; Polasko, K. ; Brown, D.M.

  • Author_Institution
    General Electric Corporate Research and Development Center P.O. Box 8 Schenectady, NY 12301
  • fYear
    1987
  • fDate
    22-23 May 1987
  • Firstpage
    13
  • Lastpage
    14
  • Abstract
    The method for applying variable proximity corrections is easily adopted to a self-contained design and fabrication system. Results show that this methodology can extend the practical limit of existing DSW exposure systems into the submicron region.
  • Keywords
    Circuit synthesis; Etching; Lithography; Optical device fabrication; Proximity effect; Research and development; Resists; Size control; System testing; Transfer functions;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1987. Digest of Technical Papers. Symposium on
  • Conference_Location
    Karuizawa, Japan
  • Type

    conf

  • Filename
    4480398
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=472726