Title :
Three Dimensional Process Simulator for Photo and Electron Beam Lithography, and Estimations of Proximity Effects
Author :
Hirai, Y. ; Sasago, M. ; Endo, M. ; Ikeda, K. ; Hayama, S. ; Tomida, S.
Author_Institution :
Semiconductor Research Center., Matsushita Electric Industrial Co., Ltd. Moriguchi, Osaka, 570 Japan
Keywords :
Diffraction; Electron beams; Etching; Fabrication; Lithography; Printing; Proximity effect; Resists; Testing; Writing;
Conference_Titel :
VLSI Technology, 1987. Digest of Technical Papers. Symposium on
Conference_Location :
Karuizawa, Japan
