Three Dimensional Process Simulator for Photo and Electron Beam Lithography, and Estimations of Proximity Effects

Author

Hirai, Y. ; Sasago, M. ; Endo, M. ; Ikeda, K. ; Hayama, S. ; Tomida, S.

Author_Institution

Semiconductor Research Center., Matsushita Electric Industrial Co., Ltd. Moriguchi, Osaka, 570 Japan

fYear

1987

fDate

22-23 May 1987

Firstpage

Lastpage

Keywords

Diffraction; Electron beams; Etching; Fabrication; Lithography; Printing; Proximity effect; Resists; Testing; Writing;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1987. Digest of Technical Papers. Symposium on

Conference_Location

Karuizawa, Japan

Type

Filename

4480399

Link To Document