DocumentCode

472729

Title

Field Isolation Process for Submicron CMOS

Author

van der Plas, P.A. ; Snels, W.C.E. ; Stolmeijer, A. ; den Blanken, H.J. ; de Werdt, R.

Author_Institution

Philips Research Laboratories P.O. BOX 80000. 5600 JA Eindhoven, The Netherlands

fYear

1987

fDate

22-23 May 1987

Firstpage

19

Lastpage

20

Keywords

CMOS process; CMOS technology; Etching; Ion implantation; MOS devices; MOSFETs; Oxidation; Planarization; Programmable logic arrays; Topology;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1987. Digest of Technical Papers. Symposium on

Conference_Location

Karuizawa, Japan

Type

conf

Filename

4480401