• DocumentCode
    472730
  • Title

    In-Situ MOS Gate Engineering in a Novel Rapid Thermal/Plasma Multiprocessing Reactor

  • Author

    Moslehi, Mehrdad M. ; Wong, Man ; Saraswat, Krishna C. ; Shatas, Steven C.

  • Author_Institution
    Center for Integrated Systems, Stanford University, Stanford, California 94305
  • fYear
    1987
  • fDate
    22-23 May 1987
  • Firstpage
    21
  • Lastpage
    22
  • Keywords
    Dielectrics and electrical insulation; Electromagnetic heating; Furnaces; Inductors; Plasma applications; Plasma materials processing; Plasma temperature; Rapid thermal processing; Thermal engineering; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1987. Digest of Technical Papers. Symposium on
  • Conference_Location
    Karuizawa, Japan
  • Type

    conf

  • Filename
    4480402
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=472730