Title :
Photo Cleaning of Si Surface after Reactive Ion Etching
Author :
Ikawa, E. ; Sugito, S. ; Aoto, N. ; Kurogi, Y.
Author_Institution :
Microelectronics Research Laboratories, NEC Corporation 1-1, Miyazaki 4-chome, Miyamae-ku, Kawasaki 213, Japan
Keywords :
Dry etching; Mercury (metals); Plasma applications; Semiconductor films; Substrates; Sulfur hexafluoride; Surface cleaning; Surface contamination; Surface morphology; Surface treatment;
Conference_Titel :
VLSI Technology, 1987. Digest of Technical Papers. Symposium on
Conference_Location :
Karuizawa, Japan
