Title :
Optical Projection Lithography Status in 1981 and Trends for the Decade
Author :
Wilczynski, Janusz S.
Author_Institution :
IBM Thomas J. Watson Research Center P.O. Box 218, Yorktown Heights, NY 10598
Keywords :
Lenses; Lithography; Nonlinear optics; Optical design; Optical devices; Optical distortion; Optical interferometry; Optical refraction; Optical sensors; Throughput;
Conference_Titel :
VLSI Technology, 1981. Digest of Technical Papers. Symposium on
Conference_Location :
Maui, HI, USA
