Title :
Deep UV Projection Lithography Using Novel Negative Resist
Author :
Obayashi, H. ; Matsuzawa, T. ; Iwayanagi, T. ; Yanazawa, H. ; Nonogaki, S. ; Tomioka, H.
Author_Institution :
Central Research Laboratory, Hitachi, Ltd., Higashi-koigakubo, Kokubunji, Tokyo, 185, Japan
Keywords :
Absorption; Aluminum; Laboratories; Lithography; Printing; Resins; Resists; Sputter etching; Surface topography; Throughput;
Conference_Titel :
VLSI Technology, 1981. Digest of Technical Papers. Symposium on
Conference_Location :
Maui, HI, USA
