Title :
EB Direct Writing Technology for Micron and Sub-Micron Structure
Author :
Mori, K. ; Iida, Y. ; Suzuki, K. ; Shinoda, D.
Author_Institution :
Basic Technology Research Laboratories, Nippon Electric Co., Ltd. Takatsu-ku, Kawasaki 213, Japan
Keywords :
Backscatter; Dry etching; Electrons; Fabrication; Lithography; Nonhomogeneous media; Resists; Sputter etching; Very large scale integration; Writing;
Conference_Titel :
VLSI Technology, 1981. Digest of Technical Papers. Symposium on
Conference_Location :
Maui, HI, USA
