• DocumentCode
    472779
  • Title

    An Ion Beam Exposure System for Mask Making

  • Author

    Yoshida, Kazue ; Kuwano, Hiroki ; Yamazaki, Shin-Ichi

  • Author_Institution
    Musashino Electrical Communication Lab., N.T.T. 3-9-11, Midoricho, Musashino-shi, Tokyo, Jpapn
  • fYear
    1981
  • fDate
    9-11 Sept. 1981
  • Firstpage
    14
  • Lastpage
    15
  • Keywords
    Etching; Focusing; Ion beams; Lenses; Optical films; Plasma applications; Plasma materials processing; Plasma measurements; Plasma sources; Resists;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1981. Digest of Technical Papers. Symposium on
  • Conference_Location
    Maui, HI, USA
  • Type

    conf

  • Filename
    4480502
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=472779