DocumentCode
472783
Title
Submicron MOSFET Structure for Minimizing Channel Hot-Electron Injection
Author
Takeda, Eiji ; Kume, Hitoshi ; Toyabe, Toru ; Asai, Shojiro
Author_Institution
Central Research Laboratory, Hitachi, Ltd. Kokubunji, Tokyo, Japan
fYear
1981
fDate
9-11 Sept. 1981
Firstpage
22
Lastpage
23
Keywords
Channel hot electron injection; Electrodes; Hot carrier injection; Impurities; Laboratories; MOS devices; MOSFET circuits; Secondary generated hot electron injection; Very large scale integration; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1981. Digest of Technical Papers. Symposium on
Conference_Location
Maui, HI, USA
Type
conf
Filename
4480506
Link To Document