A Highly Sensitive Positive Electron Resist (FBM-G)

Author

Asakawa, Hiroshi ; Kogure, Osamu

Author_Institution

Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation, Tokai, Ibaraki 319-11, Japan

fYear

1982

fDate

1-3 Sept. 1982

Firstpage

Lastpage

Keywords

Adhesives; Dry etching; Electron beams; Laboratories; Resists; Semiconductor films; Silicon compounds; Telegraphy; Telephony; Temperature sensors;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1982. Digest of Technical Papers. Symposium on

Conference_Location

Oiso, Japan

Type

Filename

4480590

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