Title :
Fine-Line High-Speed Excimer Laser Lithography
Author :
Jain, K. ; Willson, C.G. ; Lin, B.J.
Author_Institution :
IBM Research Laboratory San Jose, California 95193
Keywords :
Laser beams; Laser excitation; Laser modes; Laser transitions; Lithography; Optical pulses; Power lasers; Resists; Spatial coherence; Speckle;
Conference_Titel :
VLSI Technology, 1982. Digest of Technical Papers. Symposium on
Conference_Location :
Oiso, Japan
