Title :
Reactive Ion Etching of Poly-Si Employing Cl2 and Cl2/H2 Systems
Author :
Watanabe, T. ; Shibagaki, M. ; Horiike, Y.
Author_Institution :
Toshiba Corporation, Kawasaki, Japan
Keywords :
Anisotropic magnetoresistance; Control systems; Effluents; Etching; Fluid flow; Gases; Hydrogen; Pressure control; Voltage; Weight control;
Conference_Titel :
VLSI Technology, 1982. Digest of Technical Papers. Symposium on
Conference_Location :
Oiso, Japan
