Title :
Trench Isolation Technology and Device Physics
Author :
Goodwin, S.H. ; Plummer, J.D.
Author_Institution :
Integrated Circuits Lab, Stanford University A. E. L. 4, Stanford, CA 94305
Keywords :
Etching; Fabrication; Isolation technology; Large Hadron Collider; Oxidation; Physics; Silicon; Temperature control; Tires; Voltage;
Conference_Titel :
VLSI Technology, 1983. Digest of Technical Papers. Symposium on
Conference_Location :
Maui, HI, USA
Print_ISBN :
4-930813-05-0
