Title :
Submicron Optical Lithography Using a Double Layer Resist by a Single Development Technology
Author :
Tsuji, K. ; Sasago, M. ; Kugimiya, K.
Author_Institution :
Central Research Laboratory Matsushita Electric Industrial Company, Ltd. Moriguchi, Osaka 570, Japan
Keywords :
Coatings; Focusing; Image resolution; Laboratories; Lithography; Optical imaging; Planarization; Resists; Skin; Surface treatment;
Conference_Titel :
VLSI Technology, 1983. Digest of Technical Papers. Symposium on
Conference_Location :
Maui, HI, USA
Print_ISBN :
4-930813-05-0
