DocumentCode

472920

Title

An Improved Fabrication Process for Multi-Level Polysilicon Structures

Author

Faraone, L.

Author_Institution

RCA Laboratories Princeton, NJ 08540 U.S.A.

fYear

1983

fDate

13-15 Sept. 1983

Firstpage

110

Lastpage

111

Keywords

Amorphous materials; Breakdown voltage; Electrodes; Fabrication; Oxidation; Rough surfaces; Semiconductor films; Silicon; Surface roughness; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1983. Digest of Technical Papers. Symposium on

Conference_Location

Maui, HI, USA

Print_ISBN

4-930813-05-0

Type

conf

Filename

4480661