Title :
An Improved Fabrication Process for Multi-Level Polysilicon Structures
Author_Institution :
RCA Laboratories Princeton, NJ 08540 U.S.A.
Keywords :
Amorphous materials; Breakdown voltage; Electrodes; Fabrication; Oxidation; Rough surfaces; Semiconductor films; Silicon; Surface roughness; Temperature;
Conference_Titel :
VLSI Technology, 1983. Digest of Technical Papers. Symposium on
Conference_Location :
Maui, HI, USA
Print_ISBN :
4-930813-05-0
