472942

3-Dimensional Gate Array with Vertically Stacked Dual SOI/CMOS Structure Fabricated by Beam Recrystallization

Kawamura, S. ; Sasaki, N. ; Iwai, T. ; Mukai, R. ; Nakano, M. ; Takagi, M.

IC Development Division, Fujitsu Limited Kawasaki 211, Japan

1984

10-12 Sept. 1984

44

45

CMOS integrated circuits; CMOS technology; Fabrication; Insulation; Isolation technology; Large scale integration; Ring oscillators; Silicon on insulator technology; Three-dimensional integrated circuits; Very large scale integration;

English

ieee

VLSI Technology, 1984. Digest of Technical Papers. Symposium on

San Diego, CA, USA

4-930813-08-5

conf

4480691