DocumentCode
472952
Title
Holographic Submicron Photolithography
Author
Nomura, N. ; Kawakita, K. ; Takemoto, T. ; Matsumura, T. ; Yonezawa, T. ; Kugimiya, K.
Author_Institution
Central Research Laboratories Matsushita Electric Industrial Co., Ltd. Moriguchi, Osaka 570, Japan
fYear
1984
fDate
10-12 Sept. 1984
Firstpage
64
Lastpage
65
Keywords
Circuits; Diffraction gratings; Holography; Interference; Laser beams; Lithography; Resists; Space technology; Standards development; Wiring;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1984. Digest of Technical Papers. Symposium on
Conference_Location
San Diego, CA, USA
Print_ISBN
4-930813-08-5
Type
conf
Filename
4480701
Link To Document