• DocumentCode
    472952
  • Title

    Holographic Submicron Photolithography

  • Author

    Nomura, N. ; Kawakita, K. ; Takemoto, T. ; Matsumura, T. ; Yonezawa, T. ; Kugimiya, K.

  • Author_Institution
    Central Research Laboratories Matsushita Electric Industrial Co., Ltd. Moriguchi, Osaka 570, Japan
  • fYear
    1984
  • fDate
    10-12 Sept. 1984
  • Firstpage
    64
  • Lastpage
    65
  • Keywords
    Circuits; Diffraction gratings; Holography; Interference; Laser beams; Lithography; Resists; Space technology; Standards development; Wiring;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1984. Digest of Technical Papers. Symposium on
  • Conference_Location
    San Diego, CA, USA
  • Print_ISBN
    4-930813-08-5
  • Type

    conf

  • Filename
    4480701