DocumentCode :
472952
Title :
Holographic Submicron Photolithography
Author :
Nomura, N. ; Kawakita, K. ; Takemoto, T. ; Matsumura, T. ; Yonezawa, T. ; Kugimiya, K.
Author_Institution :
Central Research Laboratories Matsushita Electric Industrial Co., Ltd. Moriguchi, Osaka 570, Japan
fYear :
1984
fDate :
10-12 Sept. 1984
Firstpage :
64
Lastpage :
65
Keywords :
Circuits; Diffraction gratings; Holography; Interference; Laser beams; Lithography; Resists; Space technology; Standards development; Wiring;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1984. Digest of Technical Papers. Symposium on
Conference_Location :
San Diego, CA, USA
Print_ISBN :
4-930813-08-5
Type :
conf
Filename :
4480701
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=472952
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