DocumentCode
472956
Title
Electrical End Point Detection of Plasma Etched IC Contact Openings
Author
Chang, G. ; McVittie, J.P. ; Walker, J.T. ; Dutton, R.W.
Author_Institution
Integrated Circuit Laboratory Stanford University, CA 94305
fYear
1984
fDate
10-12 Sept. 1984
Firstpage
72
Lastpage
73
Keywords
Contact resistance; Monitoring; Optical detectors; Optical films; Optical sensors; Particle beam optics; Plasma applications; Resistors; Voltage; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1984. Digest of Technical Papers. Symposium on
Conference_Location
San Diego, CA, USA
Print_ISBN
4-930813-08-5
Type
conf
Filename
4480705
Link To Document