Title :
Electrical End Point Detection of Plasma Etched IC Contact Openings
Author :
Chang, G. ; McVittie, J.P. ; Walker, J.T. ; Dutton, R.W.
Author_Institution :
Integrated Circuit Laboratory Stanford University, CA 94305
Keywords :
Contact resistance; Monitoring; Optical detectors; Optical films; Optical sensors; Particle beam optics; Plasma applications; Resistors; Voltage; Wet etching;
Conference_Titel :
VLSI Technology, 1984. Digest of Technical Papers. Symposium on
Conference_Location :
San Diego, CA, USA
Print_ISBN :
4-930813-08-5
