DocumentCode :
472957
Title :
Characterization of Submicrometer Buried-Channel and Surface-Channel PMOSFETS
Author :
Yoshimi, M. ; Wada, T. ; Takahashi, M. ; Numata, K. ; Kawabuchi, K.
Author_Institution :
VLSI Research Center, Toshiba Corporation 1 Komukai, Toshiba-cho, Saiwai-ku, Kawasaki 210, Japan
fYear :
1984
fDate :
10-12 Sept. 1984
Firstpage :
76
Lastpage :
77
Keywords :
Character generation; Circuits; Controllability; Hot carriers; Implants; Ionization; MOSFETs; Stress; Threshold voltage; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1984. Digest of Technical Papers. Symposium on
Conference_Location :
San Diego, CA, USA
Print_ISBN :
4-930813-08-5
Type :
conf
Filename :
4480707
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=472957
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