Title :
Low-Power Pulsed Plasma Discharge in a Water Film Reactor
Author :
Wandell, Robert J. ; Locke, Bruce R.
Author_Institution :
Dept. of Chem. & Biomed. Eng., Florida State Univ., Tallahassee, FL, USA
Abstract :
A pulsed plasma discharge was generated from a high pressure mixture of argon and water, which flowed into an enclosed discharge region where two stainless capillary tubes serve as both the inlet and outlet to the discharge region, as well as the anode and cathode which sustain the discharge. The system is used to investigate the potential of functionalizing simple organic compounds by soft oxidation to generate more useful chemical species.
Keywords :
argon; discharges (electric); liquid films; organic compounds; oxidation; plasma chemistry; plasma materials processing; plasma sources; water; Ar-H2O; anode; cathode; chemical species; enclosed discharge region; high pressure argon-water mixture; low-power pulsed plasma discharge; organic compounds; soft oxidation; stainless capillary tubes; water film reactor; Argon; Chemicals; Electron tubes; Hydrogen; Inductors; Liquids; Plasmas; Non thermal plasma; organic compound synthesis; plasma chemistry; plasma-liquid interactions; plasma??liquid interactions; water film; water film.;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2014.2310055
