Title :
Plasma Surface Modification of Polymer Substrates for Selective Hydrophobic Control
Author :
Avram, M. ; Avram, M.A. ; Bragaru, A. ; Ghiu, A. ; Iliescu, C.
Author_Institution :
Nat. Inst. for R&D in Microtechnol. (IMT-Bucharest), Bucharest
fDate :
Oct. 15 2007-Sept. 17 2007
Abstract :
The main objective of this study is theoretical and experimental investigation of the surfaces modification of SU8, PDMS, SiO2 and Si by plasma RF treatment. Physical-chemical reactions at room temperature can be used for the modifications of the surfaces in plasma, by modifying the contact angle, superficial polymerization, or by creating hydrophilic regions and/or hydrophobic on the surfaces in contact with plasma. The argon-plasma annealing was used to generate the hydrophilic surfaces, and plasma of CF4 or CF4 with O2 has been used to create hydrophobic surfaces.
Keywords :
annealing; microfluidics; argon-plasma annealing; physical-chemical reactions; plasma surface modification; polymer substrates; selective hydrophobic control; superficial polymerization; Microchannel; Microfluidics; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma stability; Plasma temperature; Polymers; Surface topography; Surface treatment; Microfluidic; Polymers; RIE;
Conference_Titel :
Semiconductor Conference, 2007. CAS 2007. International
Conference_Location :
Sinaia
Print_ISBN :
978-1-4244-0847-4
DOI :
10.1109/SMICND.2007.4519654