DocumentCode
474307
Title
Advanced Laser Microprocessing for Substrates Microprocessing of Microsystems and Optoelectronics Devices Applications
Author
Ulieru, D. ; Tantau, Adrian ; Ulieru, E. ; Cernica, Ileana ; Matei, Alina ; Schiopu, Vasilica ; Pistritu, Florian
Author_Institution
ROMES SA, Hong Kong
Volume
1
fYear
2007
fDate
Oct. 15 2007-Sept. 17 2007
Firstpage
155
Lastpage
158
Abstract
Lasers are an important tool in the fabrication of microsystems like MOEMS and photonic components and in particular their use in scribing for separating LED dies on sapphire substrates. This paper describes scribing and cutting of sapphire and GaN using UV lasers (355 nm and 266 nm harmonics of Nd:YVO4 and 255 nm harmonic of CVL). Scribing of sapphire at speeds of 30 mm/s have been achieved and cutting of sapphire of up to 700 microns thickness has been demonstrated.
Keywords
light emitting diodes; optoelectronic devices; LED dies; MOEMS; advanced laser microprocessing; optoelectronics devices; photonic components; sapphire substrates; substrates microprocessing; Gallium nitride; Gas lasers; Laser ablation; Laser transitions; Light emitting diodes; Optical pulses; Optoelectronic devices; Power lasers; Solid lasers; Testing; LED; Laser scribing; UV lasers; gallium nitride; micromachining; sapphire;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Conference, 2007. CAS 2007. International
Conference_Location
Sinaia
ISSN
1545-827X
Print_ISBN
978-1-4244-0847-4
Type
conf
DOI
10.1109/SMICND.2007.4519670
Filename
4519670
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