RF MEMS Switches Supported by Polymeric Structures

Author

Lucibello, Andrea ; Proietti, E. ; Catoni, S. ; Frenguelli, L. ; Marcelli, Romolo ; Bartolucci, G.

Author_Institution

CNR-IMM Roma, Roma

Volume

1

fYear

2007

fDate

Oct. 15 2007-Sept. 17 2007

Firstpage

259

Lastpage

262

Abstract

RF MEMS shunt switches in coplanar waveguide (CPW) configuration have been designed, realized and tested for wideband isolation purposes. SU-8 negative photo-resist technology has been introduced for improving the bridge mechanics and the RF performances of the device. The polymeric material is used to elevate the ground planes of the CPW structure, with minor consequences on the electrical matching and an improvement in the bridge ends definition. The EM design has been followed by a sixstep photolithographic process on a 4" oxidized high resistivity silicon wafer, up to the release of the bridge by using a plasma etching technique.

Keywords

coplanar waveguides; microswitches; photolithography; sputter etching; CPW structure; RF MEMS shunt switches; SU-8 negative photo-resist technology; bridge mechanics; coplanar waveguide configuration; electrical matching; high resistivity silicon wafer; photolithographic process; plasma etching technique; polymeric structures; wideband isolation; Bridge circuits; Conductivity; Coplanar waveguides; Isolation technology; Polymers; Radio frequency; Radiofrequency microelectromechanical systems; Switches; Testing; Wideband; RF MEMS; SU-8; switches;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Conference, 2007. CAS 2007. International

Conference_Location

Sinaia

ISSN

1545-827X

Print_ISBN

978-1-4244-0847-4

Type

conf

DOI

10.1109/SMICND.2007.4519696

Filename

4519696