DocumentCode :
474569
Title :
DFM in practice: Hit or hype?
Author :
Rey, Juan C. ; Nagaraj, NS ; Kahng, Andrew ; Aitken, Rob ; Capodieci, Luigi ; Klass, Fabian ; Hou, Cliff ; Singh, Vivek
Author_Institution :
Mentor Graphics Corp., San Jose, CA
fYear :
2008
fDate :
8-13 June 2008
Firstpage :
898
Lastpage :
899
Abstract :
DFM has taken shape by virtue of manufacturers defining a series of "DFM activities", related to parametric and stochastic yield analysis and recommendations for design changes to improve yield. The picture is made more complex because the view from integrated device manufacturers, pure play foundries, and fabless semiconductor companies is not necessarily the same as they have different needs and constrains. This panel brings together DFM practitioners from each of these communities to discuss real experiences on the adoption level achieved so far as well as the impact in the manufactured products. The panel should be of interest of designers moving to advanced nodes (to learn from the experience of those that have "done it already") as well as those in the leading edge (such that they can compare experiences).
Keywords :
file organisation; operating systems (computers); DFM; desktop file management; integrated device manufacturers; stochastic yield analysis; Design for manufacture; Foundries; Graphics; Instruments; Integrated circuit yield; Libraries; Lithography; Robustness; Semiconductor device manufacture; Shape; CMP; Critical Area Analysis; DFM; Lithography; OPC; Yield;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation Conference, 2008. DAC 2008. 45th ACM/IEEE
Conference_Location :
Anaheim, CA
ISSN :
0738-100X
Print_ISBN :
978-1-60558-115-6
Type :
conf
Filename :
4555947
Link To Document :
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