Title :
Pulsed low energy electron sources for material surface modification
Author :
Korenev, S.A. ; Johnson, R.P.
Author_Institution :
Muons, Inc., 552 N. Batavia Avenue, IL 60510 USA
Abstract :
Two conceptual designs of pulsed low energy electron sources (100 to 1000 ns and 1 to 50 keV) are investigated for the modification of surface properties of materials. The first design uses plasma formed on a dielectric, which is excited by a high-frequency pulse generator. The second uses a Micro-Channel Plate (MCP) to form the cathode plasma. Experimental results are presented on the formation of pulsed high-current, low-energy electron beams with large cross-sectional area.
Keywords :
Cathodes; Conducting materials; Electron beams; Electron sources; Particle beams; Plasma materials processing; Plasma sources; Plasma temperature; Pulse generation; Voltage;
Conference_Titel :
Pulsed Power Conference, 2007 16th IEEE International
Conference_Location :
Albuquerque, NM
Print_ISBN :
978-1-4244-0913-6
Electronic_ISBN :
978-1-4244-0914-3
DOI :
10.1109/PPPS.2007.4651791
