Title :
Sub-10-nm Asymmetric Junctionless Tunnel Field-Effect Transistors
Author :
Chun-Hsing Shih ; Nguyen Van Kien
Author_Institution :
Dept. of Electr. Eng., Nat. Chi Nan Univ., Nantou, Taiwan
Abstract :
This study presents a new asymmetric junctionless tunnel field-effect transistor (AJ-TFET) to scale TFETs into sub-10-nm regimes. The asymmetric junctionless p+ source/body and junctional n/p+ drain/body separately optimize the lateral source and drain coupling to efficiently switch the TFETs, producing an abrupt on-off switching. Because of n-drain/p+body junction, the off-state tunnel barrier can be extended into the drain, ensuring an excellent short-channel effect without the limitation of channel lengths. Si/Ge heterojunctions and high-k gate insulators are combined with the AJ-TFETs for additional on-current boosting. Using compact structures and feasible parameters from practical Si-based CMOS technologies, the advancement in the on-off switching and short-channel effect make the AJ-TFET highly promising as an ideal approach into the sub-10-nm regimes.
Keywords :
CMOS integrated circuits; Ge-Si alloys; field effect transistors; insulators; tunnel transistors; CMOS; Si-Ge; TFET; high-k gate insulators; off-state tunnel barrier; short-channel effect; size 10 nm; CMOS integrated circuits; CMOS technology; IEEE Electron Devices Society; Logic gates; Silicon; Switches; Transistors; Asymmetric junctionless TFET; short-channel effect; subthreshold swing; tunnel field-effect transistor (TFET);
Journal_Title :
Electron Devices Society, IEEE Journal of the
DOI :
10.1109/JEDS.2014.2330501