DocumentCode :
47786
Title :
Relation of Refractive Index Change to Ti-Concentration in Ti-Diffused LiNbO3 Waveguide Doped With Sc3+
Author :
De-Long Zhang ; Cong-Xian Qiu ; Wing-Han Wong ; Dao-Yin Yu ; Pun, Edwin Yue-Bun
Author_Institution :
Sch. of Precision Instrum. & Optoelectron. Eng., Tianjin Univ., Tianjin, China
Volume :
32
Issue :
15
fYear :
2014
fDate :
Aug.1, 1 2014
Firstpage :
2666
Lastpage :
2670
Abstract :
Multimode Ti4+-diffused LiNbO3 planar waveguide doped with Sc3+ ions was fabricated by codiffusion of stacked Sc2O3 and Ti-metal thin film coated onto Z-cut congruent LiNbO3 substrate at 1060 °C in wet O2. The Ti4+-concentration was profiled by secondary ion mass spectrometry. The refractive index profile is constructed from measured mode index, and correlated with the Ti4+ profile. Other two related issues including the contribution of Sc3+-doping to substrate refractive index and Li2O out-diffusion were also studied. The results show that the Sc3+-doping has little contribution to the substrate index and the Li2O out-diffusion was effectively suppressed. The index change and Ti 4+-concentration follow an exponential relationship with a power index 0.54/0.79 for the ordinary/extraordinary ray. The relationship is similar to that of conventional Ti:LiNbO3 waveguide because of little contribution of Sc3+-doping to the substrate index and effective suppression for Li2O out-diffusion. Some considerations for fabricating an optical-damage-resistant Ti:Sc:LiNbO3 waveguide are given.
Keywords :
diffusion; doping; lithium compounds; metallic thin films; optical fabrication; optical planar waveguides; refractive index; scandium; secondary ion mass spectra; titanium; LiNbO3:Ti,Sc; Z-cut congruent substrate; coating; doping; metal thin film; mode index; multimode Ti4+-diffused LiNbO3 planar waveguide; optical-damage-resistant waveguide; out-diffusion; power index; refractive index profile; secondary ion mass spectrometry; temperature 1060 degC; wet O2; Educational institutions; Indexes; Lithium niobate; Optical device fabrication; Optical waveguides; Refractive index; Substrates; Photorefractive effect; Ti4+-concentration; Ti:Sc:LiNbO3 waveguide; refractive index change;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/JLT.2014.2330627
Filename :
6832430
Link To Document :
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