Title : 
Total Ionizing Dose Effects on hBN Encapsulated Graphene Devices
         
        
            Author : 
Cher Xuan Zhang ; Bin Wang ; Guo Xing Duan ; En Xia Zhang ; Fleetwood, D.M. ; Alles, Michael L. ; Schrimpf, R.D. ; Rooney, Aidan P. ; Khestanova, Ekaterina ; Auton, Gregory ; Gorbachev, Roman V. ; Haigh, Sarah J. ; Pantelides, Sokrates T.
         
        
            Author_Institution : 
Electr. Eng. & Comput. Sci. Dept., Vanderbilt Univ., Nashville, TN, USA
         
        
        
        
        
        
        
        
            Abstract : 
The constant-voltage electrical stress and 10-keV X-ray irradiation responses of encapsulated graphene-hBN devices are evaluated. Both constant-voltage stress and X-ray exposure induce only modest shifts in the current and the Dirac point of the graphene. Charge trapping at or near the graphene/BN interface is observed after X-ray irradiation. The experimental results suggest that net hole trapping occurs in the BN at low doses and that net electron trapping occurs at higher doses. First-principles calculations also demonstrate that hydrogenated substitutional carbon impurities at B/N sites at or near the graphene/BN interface can play an additional role in the radiation response of these structures.
         
        
            Keywords : 
III-V semiconductors; X-ray effects; ab initio calculations; boron; carbon; electron traps; graphene; graphene devices; hole traps; hydrogen; impurities; semiconductor-insulator boundaries; wide band gap semiconductors; BN-C:C:H; Dirac point; X-ray irradiation responses; charge trapping; constant-voltage electrical stress; current shifts; electron volt energy 10 keV; encapsulated graphene devices; first principles calculations; hydrogenated substitutional carbon impurities; net electron trapping; net hole trapping; total ionizing dose effects; Boron; Carbon; Charge carrier processes; Graphene; Hydrogen; BN; dehydrogenation; substitutional carbon; total ionizing dose;
         
        
        
            Journal_Title : 
Nuclear Science, IEEE Transactions on
         
        
        
        
        
            DOI : 
10.1109/TNS.2014.2367036