DocumentCode :
481351
Title :
Discussion on the improved diffractive superresolution element of the two-photon microfabrication
Author :
Wei, Peng ; Zhu, Yu ; Tan, Qiaofeng ; Duan, Guanghong
Author_Institution :
Institute of Manufacturing Engineering, Department of Precision Instruments and Mechanology, Tsinghua University, Beijing 100084, China
fYear :
2006
fDate :
6-7 Nov. 2006
Firstpage :
1505
Lastpage :
1508
Abstract :
The improved diffractive superresolution element (DSE) is being applied to improve the microfabrication radial superresolution in the two-photon three dimension (3D) microfabrication system, which appeared only a few years ago and can provide the ability to confine photochemical and physical reactions to the order of laser wavelength in three dimensions. The design method of the improved DSE is that maximizing S if the highest limit Mu of the M and the highest limit Gu of the G is set, where reference [1] explained the definition of the S, M and G. Simulation result proved that the microfabrication radial superresolution can be got by the improved optical DSE. The phenomenon can only be interpreted as the intensity of high-order and side of the zero-order diffraction peaks have been clapped under the two-photon absorption (TPA) polymerization threshold. In a word the polymerized volume can be chosen because the Mu and the Gu is correspondingly adjustable, even if the laser wavelength, objective lens and the photosensitive resin is fixed for a given microfabrication system. That means the radial superresolution of the two-photon microfabrication can be chosen.
Keywords :
Two-photon three dimension microfabrication; improved diffractive superresolution element; microfabrication radial superresolution;
fLanguage :
English
Publisher :
iet
Conference_Titel :
Technology and Innovation Conference, 2006. ITIC 2006. International
Conference_Location :
Hangzhou
ISSN :
0537-9989
Print_ISBN :
0-86341-696-9
Type :
conf
Filename :
4752243
Link To Document :
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