• DocumentCode
    490574
  • Title

    A Process Simulator for pH Control Studies

  • Author

    Choi, J.Y. ; Pandit, H.G. ; Rhinehart, R.R.

  • Author_Institution
    Dept. of Chemical Engineering, Texas Tech University, Lubbock, Texas 79409-3121
  • fYear
    1993
  • fDate
    2-4 June 1993
  • Firstpage
    2594
  • Lastpage
    2595
  • Abstract
    A dynamic simulator for pH control studies is offered. The process influent is composed of various mono-and di-valent acids, bases, and common ion salts and is treated with a multi-component reagent (either acidic or basic). Mixing is in a non-ideal continuous flow stirred tank. Dynamic behavior includes autoregressive influent composition and sensor calibration drifts, sensor lags, and measurement noise. Idealizations in the model were intentionally chosen to balance computational effort with output accuracy. The program output is shown to duplicate a wide range of pH results and to be sufficiently accurate for industrial pH control simulations.
  • Keywords
    Birth disorders; Chemicals; Equations; Kirchhoff´s Law; Nose; Process control; Robustness; Silicon compounds; Tellurium; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    American Control Conference, 1993
  • Conference_Location
    San Francisco, CA, USA
  • Print_ISBN
    0-7803-0860-3
  • Type

    conf

  • Filename
    4793362