DocumentCode
490574
Title
A Process Simulator for pH Control Studies
Author
Choi, J.Y. ; Pandit, H.G. ; Rhinehart, R.R.
Author_Institution
Dept. of Chemical Engineering, Texas Tech University, Lubbock, Texas 79409-3121
fYear
1993
fDate
2-4 June 1993
Firstpage
2594
Lastpage
2595
Abstract
A dynamic simulator for pH control studies is offered. The process influent is composed of various mono-and di-valent acids, bases, and common ion salts and is treated with a multi-component reagent (either acidic or basic). Mixing is in a non-ideal continuous flow stirred tank. Dynamic behavior includes autoregressive influent composition and sensor calibration drifts, sensor lags, and measurement noise. Idealizations in the model were intentionally chosen to balance computational effort with output accuracy. The program output is shown to duplicate a wide range of pH results and to be sufficiently accurate for industrial pH control simulations.
Keywords
Birth disorders; Chemicals; Equations; Kirchhoff´s Law; Nose; Process control; Robustness; Silicon compounds; Tellurium; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
American Control Conference, 1993
Conference_Location
San Francisco, CA, USA
Print_ISBN
0-7803-0860-3
Type
conf
Filename
4793362
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