Title :
A Process Simulator for pH Control Studies
Author :
Choi, J.Y. ; Pandit, H.G. ; Rhinehart, R.R.
Author_Institution :
Dept. of Chemical Engineering, Texas Tech University, Lubbock, Texas 79409-3121
Abstract :
A dynamic simulator for pH control studies is offered. The process influent is composed of various mono-and di-valent acids, bases, and common ion salts and is treated with a multi-component reagent (either acidic or basic). Mixing is in a non-ideal continuous flow stirred tank. Dynamic behavior includes autoregressive influent composition and sensor calibration drifts, sensor lags, and measurement noise. Idealizations in the model were intentionally chosen to balance computational effort with output accuracy. The program output is shown to duplicate a wide range of pH results and to be sufficiently accurate for industrial pH control simulations.
Keywords :
Birth disorders; Chemicals; Equations; Kirchhoff´s Law; Nose; Process control; Robustness; Silicon compounds; Tellurium; Testing;
Conference_Titel :
American Control Conference, 1993
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-0860-3