Title :
Applications of Control to Semiconductor Manufacturing: Reactive Ion Etching
Author :
Elta, M. ; Etemad, H. ; Freudenberg, J.S. ; Giles, M.D. ; Grizzle, J.W. ; Kabamba, P.T. ; Khargonekar, P.P. ; Lafortune, S. ; Meerkov, S.M. ; Moyne, J.R. ; Rashap, B.A. ; Teneketzis, D. ; Terry, F.L., Jr.
Author_Institution :
Solid State Electronics Laboratory, Deparment of Electrical Engineering and Computer Science, The university of Michigan, Ann Arbor, MI 48109-2122.
Abstract :
This paper describes the development of real-time control technology for the improvement of manufacturing characteristics of reactive ion etchers. A general control strategy is presented as well as supporting experimental results.
Keywords :
Control systems; Etching; Feedback control; Laboratories; Manufacturing processes; Plasma applications; Plasma materials processing; Production facilities; Pulp manufacturing; Semiconductor device manufacture;
Conference_Titel :
American Control Conference, 1993
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-0860-3
