DocumentCode :
49155
Title :
On-Wafer Optical Loss Measurements Using Ring Resonators With Integrated Sources and Detectors
Author :
Bitincka, E. ; Gilardi, Giovanni ; Smit, Meint K.
Author_Institution :
Dept. of Electr. Eng., Univ. of Technol. Eindhoven, Eindhoven, Netherlands
Volume :
6
Issue :
5
fYear :
2014
fDate :
Oct. 2014
Firstpage :
1
Lastpage :
12
Abstract :
We demonstrate for the first time a fully integrated test structure dedicated to on-wafer propagation loss measurement. An integrated light source is used in combination with a resonant cavity and a full absorbing detector. It is fabricated in a multi project wafer run in an InP based foundry process. The probing of the integrated light source and detector with electrical signals avoids the reproducibility issues and time-overhead associated with high-precision optical alignment. The measurement accuracy, estimated to be ~±0.2, the compact footprint (~1.5 mm2), and the simple and fast measurement procedure make this approach an ideal candidate for the future characterization of propagation losses in both research and manufacturing environments.
Keywords :
III-V semiconductors; indium compounds; integrated optics; optical losses; optical resonators; optical variables measurement; -wafer propagation loss measurement; InP; full absorbing detector; fully integrated test structure; integrated light source; measurement accuracy; on-wafer optical loss measurements; resonant cavity; ring resonators; Couplings; Loss measurement; Optical device fabrication; Optical ring resonators; Optical variables measurement; Propagation losses; Semiconductor device measurement; Waveguide devices; fabrication and characterization; semiconductor materials;
fLanguage :
English
Journal_Title :
Photonics Journal, IEEE
Publisher :
ieee
ISSN :
1943-0655
Type :
jour
DOI :
10.1109/JPHOT.2014.2352627
Filename :
6887349
Link To Document :
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