DocumentCode :
49388
Title :
Influence by Layer Structure on the Output EL of CMOS Compatible Silicon-Based Light Emitters
Author :
Gonzalez-Fernandez, A.A. ; Juvert, Joan ; Aceves-Mijares, M. ; Llobera, Andreu ; Dominguez, C.
Author_Institution :
Centro Nac. de Microelectron.-Consejo Super. de Investig. Cientificas, Inst. de Microelectranica de Barcelona, Barcelona, Spain
Volume :
60
Issue :
6
fYear :
2013
fDate :
Jun-13
Firstpage :
1971
Lastpage :
1974
Abstract :
Fully combined metal-oxide-semiconductor compatible light-emitting devices based on nano bi-layer structures are fabricated. The active layers are composed of silicon nitride on top of a silicon-enriched silicon dioxide film with different Si concentrations. Electro and photo luminescence spectra of the devices and the active materials are analyzed and correlated to verify if the origin of the emission is the same. Differences found between electrically and optically stimulated photo-emission in the studied region of the spectra are concluded to be due to optical phenomena introduced by the gate and multilayer configuration, meaning that the same radiative centers are stimulated optically and electrically.
Keywords :
CMOS integrated circuits; electroluminescence; light emitting devices; silicon compounds; CMOS; active material; combined metal-oxide-semiconductor; electroluminescence spectra; multilayer configuration; nano bilayer structure; photo-emission; photoluminescence spectra; silicon nitride; silicon-based light emitter; silicon-enriched silicon dioxide film; Electroluminescence (EL); light-emitting capacitor; photoluminescence; silicon rich oxide;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2013.2258158
Filename :
6514126
Link To Document :
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