DocumentCode
49388
Title
Influence by Layer Structure on the Output EL of CMOS Compatible Silicon-Based Light Emitters
Author
Gonzalez-Fernandez, A.A. ; Juvert, Joan ; Aceves-Mijares, M. ; Llobera, Andreu ; Dominguez, C.
Author_Institution
Centro Nac. de Microelectron.-Consejo Super. de Investig. Cientificas, Inst. de Microelectranica de Barcelona, Barcelona, Spain
Volume
60
Issue
6
fYear
2013
fDate
Jun-13
Firstpage
1971
Lastpage
1974
Abstract
Fully combined metal-oxide-semiconductor compatible light-emitting devices based on nano bi-layer structures are fabricated. The active layers are composed of silicon nitride on top of a silicon-enriched silicon dioxide film with different Si concentrations. Electro and photo luminescence spectra of the devices and the active materials are analyzed and correlated to verify if the origin of the emission is the same. Differences found between electrically and optically stimulated photo-emission in the studied region of the spectra are concluded to be due to optical phenomena introduced by the gate and multilayer configuration, meaning that the same radiative centers are stimulated optically and electrically.
Keywords
CMOS integrated circuits; electroluminescence; light emitting devices; silicon compounds; CMOS; active material; combined metal-oxide-semiconductor; electroluminescence spectra; multilayer configuration; nano bilayer structure; photo-emission; photoluminescence spectra; silicon nitride; silicon-based light emitter; silicon-enriched silicon dioxide film; Electroluminescence (EL); light-emitting capacitor; photoluminescence; silicon rich oxide;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2013.2258158
Filename
6514126
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