• DocumentCode
    49388
  • Title

    Influence by Layer Structure on the Output EL of CMOS Compatible Silicon-Based Light Emitters

  • Author

    Gonzalez-Fernandez, A.A. ; Juvert, Joan ; Aceves-Mijares, M. ; Llobera, Andreu ; Dominguez, C.

  • Author_Institution
    Centro Nac. de Microelectron.-Consejo Super. de Investig. Cientificas, Inst. de Microelectranica de Barcelona, Barcelona, Spain
  • Volume
    60
  • Issue
    6
  • fYear
    2013
  • fDate
    Jun-13
  • Firstpage
    1971
  • Lastpage
    1974
  • Abstract
    Fully combined metal-oxide-semiconductor compatible light-emitting devices based on nano bi-layer structures are fabricated. The active layers are composed of silicon nitride on top of a silicon-enriched silicon dioxide film with different Si concentrations. Electro and photo luminescence spectra of the devices and the active materials are analyzed and correlated to verify if the origin of the emission is the same. Differences found between electrically and optically stimulated photo-emission in the studied region of the spectra are concluded to be due to optical phenomena introduced by the gate and multilayer configuration, meaning that the same radiative centers are stimulated optically and electrically.
  • Keywords
    CMOS integrated circuits; electroluminescence; light emitting devices; silicon compounds; CMOS; active material; combined metal-oxide-semiconductor; electroluminescence spectra; multilayer configuration; nano bilayer structure; photo-emission; photoluminescence spectra; silicon nitride; silicon-based light emitter; silicon-enriched silicon dioxide film; Electroluminescence (EL); light-emitting capacitor; photoluminescence; silicon rich oxide;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2013.2258158
  • Filename
    6514126