• DocumentCode
    497198
  • Title

    Process-design considerations for three dimensional memory integration

  • Author

    Iyer, S.S. ; Kirihata, T. ; Wordeman, M.R. ; Barth, J. ; Hannon, R.H. ; Malik, R.

  • Author_Institution
    Semicond. R&D Center, IBM Corp., Hopewell Junction, NY, USA
  • fYear
    2009
  • fDate
    16-18 June 2009
  • Firstpage
    60
  • Lastpage
    63
  • Abstract
    3D integration of memory for both memory and processor caches provide a fertile application space for 3D integration. A simple 2 strata stack can reduce individual die size by approximately half, improving chip yield. Multi chip memory stacks can ease packaging and can significantly reduce power for main memory. Such stacks are easily testable and repairable through redundancy The design of such 3D stacks is critically dependent on the TSV technology used and is expected to become more attractive as TSV diameters and TSV overhead reduce.
  • Keywords
    cache storage; elemental semiconductors; integrated circuit yield; microprocessor chips; redundancy; silicon; 3D memory integration; Si; chip yield; memory caches; multichip memory stacks; processor caches; redundancy; strata stack; through silicon vias; Integrated circuit interconnections; Laminates; Packaging; Power supplies; Productivity; Prototypes; Random access memory; Silicon; Space technology; Through-silicon vias;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 2009 Symposium on
  • Conference_Location
    Honolulu, HI
  • Print_ISBN
    978-1-4244-3308-7
  • Type

    conf

  • Filename
    5200635