DocumentCode
497198
Title
Process-design considerations for three dimensional memory integration
Author
Iyer, S.S. ; Kirihata, T. ; Wordeman, M.R. ; Barth, J. ; Hannon, R.H. ; Malik, R.
Author_Institution
Semicond. R&D Center, IBM Corp., Hopewell Junction, NY, USA
fYear
2009
fDate
16-18 June 2009
Firstpage
60
Lastpage
63
Abstract
3D integration of memory for both memory and processor caches provide a fertile application space for 3D integration. A simple 2 strata stack can reduce individual die size by approximately half, improving chip yield. Multi chip memory stacks can ease packaging and can significantly reduce power for main memory. Such stacks are easily testable and repairable through redundancy The design of such 3D stacks is critically dependent on the TSV technology used and is expected to become more attractive as TSV diameters and TSV overhead reduce.
Keywords
cache storage; elemental semiconductors; integrated circuit yield; microprocessor chips; redundancy; silicon; 3D memory integration; Si; chip yield; memory caches; multichip memory stacks; processor caches; redundancy; strata stack; through silicon vias; Integrated circuit interconnections; Laminates; Packaging; Power supplies; Productivity; Prototypes; Random access memory; Silicon; Space technology; Through-silicon vias;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 2009 Symposium on
Conference_Location
Honolulu, HI
Print_ISBN
978-1-4244-3308-7
Type
conf
Filename
5200635
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