DocumentCode :
49890
Title :
High-voltage superjunction VDMOS with low reverse recovery loss
Author :
Zhu, Junan ; Yang, Zengli ; Sun, W.F. ; Qian, Q.S. ; Xu, Songcen ; Yi, Y.B.
Author_Institution :
Nat. ASIC Syst. Eng. Res. Center, Southeast Univ., Nanjing, China
Volume :
49
Issue :
3
fYear :
2013
fDate :
Jan. 31 2013
Firstpage :
219
Lastpage :
220
Abstract :
A new design of the high-voltage superjunction VDMOS (SJ-VDMOS) structure is proposed to minimise the reverse recovery losses of the body diode and the noise during the switching process. The key feature of the structure is that a discontinuous P+ region in the source is implemented which can decrease the carrier injection efficiency. Numerical results indicate that the reverse recovery charge and the overshoot voltage of the proposed structure is decreased by 76.5% and 52.5%, respectively, compared to the conventional SJ-VDMOS structure, while maintaining the same breakdown voltage.
Keywords :
MIS structures; MOSFET; semiconductor device noise; semiconductor diodes; SJ-VDMOS structure; body diode; breakdown voltage; carrier injection efficiency; discontinuous P+ region; high-voltage superjunction VDMOS; low reverse recovery loss; overshoot voltage; reverse recovery charge; switching process;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el.2012.3541
Filename :
6457582
Link To Document :
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