DocumentCode :
499201
Title :
Etching depth dependence of emission properties from InGaN/GaN light emitting diodes with nanohole arrays: Analysis of strain relaxation and surface states
Author :
Chang, Cheng-Yu ; Wu, Yuh-Renn
Author_Institution :
Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
fYear :
2009
fDate :
2-4 June 2009
Firstpage :
1
Lastpage :
2
Abstract :
The effects etching depths of nanohole arrays close to or penetrate the quantum well structures are studied. Our results suggest that when the hole depth is close to the quantum well region, the surface states pinning reduces the band bending and leads to a blue shift of the emission spectrum. When the hole penetrates the quantum well region, similar effects are observed but are due to the strain relaxation in the quantum well.
Keywords :
III-V semiconductors; etching; gallium compounds; light emitting diodes; nanotechnology; quantum well devices; wide band gap semiconductors; InGaN-GaN; band bending; etching depth dependence; hole depth; light emitting diodes; nanohole arrays; quantum well structures; strain relaxation; surface states; Capacitive sensors; Etching; Gallium nitride; Light emitting diodes; Nanoscale devices; Nanostructures; Optical arrays; Photonic crystals; Piezoelectric polarization; Stimulated emission; (230.3670) Light-emitting diodes; (250.5590) Quantum-well, -wire and -dot devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-869-8
Electronic_ISBN :
978-1-55752-869-8
Type :
conf
Filename :
5224280
Link To Document :
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