Title :
13.2 nm table-top inspection microscope for extreme ultraviolet lithography mask defect characterization
Author :
Brizuela, Fernando ; Wang, Yong ; Brewer, Courtney A. ; Pedaci, Francesco ; Chao, Weilun ; Anderson, Erik H. ; Liu, Yanwei ; Goldberg, V. Kenneth A ; Naulleau, Patrick ; Wachulak, Przemyslaw ; Marconi, Mario C. ; Attwood, David T. ; Rocca, Jorge J. ; Meno
Author_Institution :
NSF ERC for Extreme Ultraviolet Sci. & Technol., Colorado State Univ., Fort Collins, CO, USA
Abstract :
We report on a reflection microscope that operates at 13.2-nm wavelength with a spatial resolution of 55 plusmn 3 nm. The microscope uses a table-top EUV laser to acquire images of photolithography masks in 20 seconds.
Keywords :
masks; nondestructive testing; optical microscopes; ultraviolet lithography; extreme ultraviolet lithography; mask defect characterization; photolithography masks; reflection microscope; table-top inspection microscope; Inspection; Laboratories; Laser modes; Lighting; Lithography; Optical microscopy; Spatial resolution; Ultraviolet sources; X-ray imaging; X-ray lasers; (110.7440) X-ray imaging; (140.7240) UV, EUV and X-ray lasers; (180.7460) X-ray microscopy;
Conference_Titel :
Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-869-8
Electronic_ISBN :
978-1-55752-869-8
