• DocumentCode
    499698
  • Title

    The role of native and transient laser-induced defects in the femtosecond breakdown of dielectric films

  • Author

    Emmert, Luke A. ; Nguyen, Duy ; Mero, Mark ; Rudolph, Wolfgang ; Patel, Dinesh ; Krous, Eric ; Menoni, Carmen S.

  • Author_Institution
    Dept. of Phys. & Astron., Univ. of New Mexico, Albuquerque, NM, USA
  • fYear
    2009
  • fDate
    2-4 June 2009
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Experiments and modeling reveal that the dielectric breakdown of hafnia films is controlled by laser induced and native defects under multiple femtosecond pulse exposure. Transient processes occur on a 100 ps and 10 ms timescale.
  • Keywords
    dielectric thin films; electric breakdown; hafnium compounds; laser beam effects; HfO2; dielectric films; femtosecond breakdown; femtosecond pulse exposure; native defects; time 100 ps; transient laser-induced defects; Conducting materials; Dielectric breakdown; Dielectric films; Electric breakdown; Electrons; Laser ablation; Laser theory; Optical films; Optical pulses; Ultrafast optics; (140.3440) laser-induced breakdown; (310.6860) thin films, optical properties;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on
  • Conference_Location
    Baltimore, MD
  • Print_ISBN
    978-1-55752-869-8
  • Electronic_ISBN
    978-1-55752-869-8
  • Type

    conf

  • Filename
    5225026
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=499698