Refractive index engineering of a tunable channel waveguide array by the He⁺ implantation in an electrooptic KLTN substrate

Author

Gumennik, Alexander ; Perepelitsa, Galina ; Israel, Abraham ; Agranat, Aharon J.

Author_Institution

Dept. of Appl. Phys., Hebrew Univ., Jerusalem, Israel

fYear

2009

fDate

2-4 June 2009

Firstpage

1

Lastpage

2

Abstract

Measurements of an electrooptic tunability of a channel array waveguide, fabricated by ion implantations through a comb-like stopping mask, revealed that the implantation through the active volume of the device didn´t diminish its electrooptic properties.

Keywords

electro-optical devices; ion implantation; lithium compounds; optical arrays; optical fabrication; optical waveguides; potassium compounds; refractive index; He⁺; KLiTaO₃NbO₃; electrooptic KLTN substrate; electrooptic property; electrooptic tunability measurement; ion implantation; refractive index engineering; tunable channel waveguide array fabrication; Crystalline materials; Crystallization; Electrooptic devices; Gold; Helium; Optical refraction; Optical variables control; Optical waveguides; Refractive index; Substrates; (130.0250) Optoelectronics; (220.4000) Microstructure fabrication;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on

Conference_Location

Baltimore, MD

Print_ISBN

978-1-55752-869-8

Electronic_ISBN

978-1-55752-869-8

Type

conf

Filename

5225213

Refractive index engineering of a tunable channel waveguide array by the He+ implantation in an electrooptic KLTN substrate

Gumennik, Alexander ; Perepelitsa, Galina ; Israel, Abraham ; Agranat, Aharon J.

conf

Refractive index engineering of a tunable channel waveguide array by the He⁺ implantation in an electrooptic KLTN substrate