DocumentCode
499909
Title
Nanometer metrology using ultrafast optoacoustics
Author
Grimsley, Thomas ; Yang, Fan ; Dang, Cuong ; Che, Shan ; Antonelli, Andrew ; Maris, Humphrey ; Zhang, Qiang ; Nurmikko, Arto
Author_Institution
Phys. Dept., Brown Univ., Providence, RI, USA
fYear
2009
fDate
2-4 June 2009
Firstpage
1
Lastpage
2
Abstract
We present a method for accessing nanoscale dimensions in semiconductor wafer metrology, using ultrafast optoacoustic ranging. One illustrative example is the measurement of dimensions and profile of nanometer scale deep trenches in silicon-wafer based structures.
Keywords
nanotechnology; nondestructive testing; photoacoustic effect; nanometer metrology; nanometer scale deep trench; semiconductor wafer metrology; ultrafast optoacoustic ranging; Acoustic pulses; Metrology; Optical attenuators; Optical films; Optical pulse generation; Optical pulses; Optical pumping; Optical scattering; Silicon compounds; Ultrasonic imaging; (120.3940) Metrology; (120.6660) Surface measurements, figure;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on
Conference_Location
Baltimore, MD
Print_ISBN
978-1-55752-869-8
Electronic_ISBN
978-1-55752-869-8
Type
conf
Filename
5225279
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