DocumentCode
500412
Title
Atomic nanofabrication of periodic structures
Author
Allred, Claire ; Reeves, Jason ; Corder, Christopher ; Metcalf, Harold
Author_Institution
Dept. of Phys. & Astron., Stony Brook Univ., Stony Brook, NY, USA
fYear
2009
fDate
2-4 June 2009
Firstpage
1
Lastpage
2
Abstract
Metastable helium has 20 eV of internal energy that destroys a resist assembled on a wafer. An optical standing wave was used to channel and focus the He* atoms into lines separated by lambda /2.
Keywords
helium; metamaterials; nanofabrication; photoresists; atomic nanofabrication; electron volt energy 20 eV; metastable helium; optical standing wave; periodic structures; resist assembled on a wafer; Atom optics; Atomic beams; Atomic layer deposition; Atomic measurements; Etching; Helium; Metastasis; Nanofabrication; Periodic structures; Resists; 020.3320; 160.4236;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on
Conference_Location
Baltimore, MD
Print_ISBN
978-1-55752-869-8
Electronic_ISBN
978-1-55752-869-8
Type
conf
Filename
5225805
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