DocumentCode :
500550
Title :
Fabrication of antireflection nanostructures on GaAs by holographic lithography for device applications
Author :
Song, Y.M. ; Bae, S.Y. ; Yu, J.S. ; Lee, Y.T.
Author_Institution :
Dept. of Info. & Comm., Gwangju Inst. of Sci. & Technol., Gwangju, South Korea
fYear :
2009
fDate :
2-4 June 2009
Firstpage :
1
Lastpage :
2
Abstract :
We demonstrate the fabrication of antireflection nanostructures on GaAs using holographic lithography. Measured results of the fabricated nanostructures are in good agreement with the calculated values using a RCWA model, effectively suppressing the surface reflection over visible and near-infrared ranges.
Keywords :
antireflection coatings; gallium arsenide; holography; infrared spectra; nanofabrication; nanolithography; nanophotonics; optical fabrication; photolithography; visible spectra; GaAs; RCWA model; antireflection nanostructure fabrication; holographic lithography; near-infrared range; surface reflection suppression; visible range; Etching; Gallium arsenide; Holography; Lithography; Nanostructures; Optical device fabrication; Optical devices; Power measurement; Reflectivity; Wavelength measurement; (050.6624) Subwavelength structures; (220.4241) Nanostructure fabrication; (260.2710) Inhomogeneous optical media;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-869-8
Electronic_ISBN :
978-1-55752-869-8
Type :
conf
Filename :
5225962
Link To Document :
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