Title :
Fabrication of antireflection nanostructures on GaAs by holographic lithography for device applications
Author :
Song, Y.M. ; Bae, S.Y. ; Yu, J.S. ; Lee, Y.T.
Author_Institution :
Dept. of Info. & Comm., Gwangju Inst. of Sci. & Technol., Gwangju, South Korea
Abstract :
We demonstrate the fabrication of antireflection nanostructures on GaAs using holographic lithography. Measured results of the fabricated nanostructures are in good agreement with the calculated values using a RCWA model, effectively suppressing the surface reflection over visible and near-infrared ranges.
Keywords :
antireflection coatings; gallium arsenide; holography; infrared spectra; nanofabrication; nanolithography; nanophotonics; optical fabrication; photolithography; visible spectra; GaAs; RCWA model; antireflection nanostructure fabrication; holographic lithography; near-infrared range; surface reflection suppression; visible range; Etching; Gallium arsenide; Holography; Lithography; Nanostructures; Optical device fabrication; Optical devices; Power measurement; Reflectivity; Wavelength measurement; (050.6624) Subwavelength structures; (220.4241) Nanostructure fabrication; (260.2710) Inhomogeneous optical media;
Conference_Titel :
Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-869-8
Electronic_ISBN :
978-1-55752-869-8
