Title :
Parallel direct-write nanolithography using arrays of optically trapped microlenses
Author :
McLeod, Euan ; Arnold, Craig B.
Author_Institution :
Mech. & Aerosp. Eng., Princeton Univ., Princeton, NJ, USA
Abstract :
We use Bessel beam optical traps to self-position arrays of microsphere objectives near surfaces. Pulsed laser illumination of these objectives is used to perform near-field direct-write subwavelength optical nanopatterning with 100 nm feature sizes.
Keywords :
laser beams; laser materials processing; microlenses; nanolithography; nanopatterning; nanophotonics; optical arrays; optical fabrication; radiation pressure; Bessel beam; array self-positioning; direct-write optical nanopatterning; microlens arrays; microsphere objectives; near-field optical nanopatterning; optical traps; optically trapped microlenses; parallel direct-write nanolithography; pulsed laser illumination; subwavelength optical nanopatterning; Charge carrier processes; Laser beams; Lenses; Lighting; Microoptics; Nanolithography; Nanopatterning; Optical arrays; Optical beams; Optical pulses; (350.3390) Laser materials processing; (350.4855) Optical tweezers or optical manipulation;
Conference_Titel :
Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-869-8
Electronic_ISBN :
978-1-55752-869-8
