Title :
An efficient resistance sensitivity extraction algorithm for conductors of arbitrary shapes
Author :
Dewey, B. ; Elfadel, I.M. ; El-Moselhy, T.
Author_Institution :
IBM, East Fishkill, NY, USA
Abstract :
Due to technology scaling, integrated circuit manufacturing techniques are producing structures with large variabilities in their dimensions. To guarantee high yield, the manufactured structures must have the proper electrical characteristics despite such geometrical variations. For a designer, this means extracting the electrical characteristics of a whole family of structure realizations in order to guarantee that they all satisfy the required electrical characteristics. Sensitivity extraction provides an efficient algorithm to extract all realizations concurrently. This paper presents a complete framework for efficient resistance sensitivity extraction. The framework is based on both the finite element method (FEM) for resistance extraction and the adjoint method for sensitivity analysis. FEM enables the calculation of resistances of interconnects of arbitrary shapes, while the adjoint method enables sensitivity calculation in a computational complexity that is independent of the number of varying parameters. The accuracy and efficiency of the algorithm are demonstrated on a variety of complex examples.
Keywords :
VLSI; computational complexity; conductors (electric); finite element analysis; sensitivity analysis; shape measurement; adjoint method; arbitrary shape; computational complexity; electrical characteristic; finite element method; integrated circuit manufacturing technique; resistance sensitivity extraction algorithm; sensitivity analysis; Conductors; Electric resistance; Electric variables; Finite element methods; Integrated circuit manufacture; Integrated circuit technology; Integrated circuit yield; Manufacturing; Sensitivity analysis; Shape; adjoint method; finite-element method; resistance extraction; sensitivity; shape variations;
Conference_Titel :
Design Automation Conference, 2009. DAC '09. 46th ACM/IEEE
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-6055-8497-3