Use of lithography simulation for the calibration of equation-based design rule checks

Designers using one-dimension measurements in nanometer designs can´t readily identify features prone to excessive variation during processing. Process simulation provides high resolution checking, but requires significant computing resources. Equation-based design rule checking (eqDRC) offers the DRC performance with capture of complex process issues using multi-dimensional equations. One challenge to adopting eqDRC is the definition and calibration of the equations. We will show how a lithographic simulator can be used to define and calibrate an eqDRC equation.