Title :
Wafer charging evaluation method of ion milling in GMR head manufacturing using antenna test element group
Author :
Kakuta, Shigeru ; Taniguchi, Hitoshi ; Kondo, Akira ; Ikeda, Hidehiro ; Furusawa, Kenji ; Todoroki, Satoru
Author_Institution :
Production Eng. Res. Lab., Hitachi Ltd., Yokohama, Japan
Abstract :
An antenna test element group (TEG), used for the evaluation of wafer charging in semiconductor fabrication, is applied to ion milling in the fabrication of GMR heads. The antenna TEG can quantitatively evaluate the potential for ESD damage to the GMR heads. The differences between thermal electron and microwave plasma neutralization are discussed.
Keywords :
antennas; electrostatic discharge; giant magnetoresistance; magnetic heads; milling; ESD damage; GMR head manufacturing; antenna test element group; ion milling; microwave plasma neutralization; semiconductor fabrication; thermal electron; wafer charging evaluation method; Consumer electronics; Electronic mail; Electrostatic discharge; GSM; Manufacturing; Milling; Multiaccess communication; Radio frequency; Telephone sets; Testing;
Conference_Titel :
Electrical Overstress/Electrostatic Discharge Symposium, 2001. EOS/ESD '01.
Conference_Location :
Portland, OR
Print_ISBN :
978-1-5853-7039-9
Electronic_ISBN :
978-1-5853-7039-9
