Title :
Breakdown evaluation of ultrathin barrier magnetic tunnel junctions with V-Ramp testing
Author :
Chuan-Fang Jiang ; Liu, R. ; Zhao-Yu Teng ; Li, W. ; Chou, S.
Author_Institution :
SAE Technol. Dev. Co. Ltd., Dongguan, China
Abstract :
Ultrathin alumina barrier magnetic tunnel junctions (MTJs) were tested by ramping the voltage across the barrier at different rates ranging from 0.2 mV/s to 20 mV/s at room temperature. Two distributions of breakdown voltage - intrinsic and extrinsic, are found in the stress test of MTJs. The threshold voltage is 0.6-0.7 V and 0.3-0.5 V for the intrinsic and extrinsic breakdown respectively. Intrinsic breakdown is described by E-model, where lifetime decreases exponentially with increasing junction voltage. A logarithmic relationship between breakdown voltage and ramp rate is observed. Both intrinsic and extrinsic MTJ data fits well to Simmons´ model, and reasonable estimates for barrier height and barrier thickness are derived.
Keywords :
alumina; cobalt alloys; electric breakdown; ferromagnetic materials; iron alloys; magnetic heads; magnetic recording; magnetic tunnelling; CoFe-AlOx; E-model; Simmons model; V-ramp testing; barrier height; barrier thickness; breakdown evaluation; extrinsic breakdown voltage; intrinsic breakdown voltage; magnetic recording heads; stress test; temperature 293 K to 298 K; threshold voltage; ultrathin barrier magnetic tunnel junctions; Breakdown voltage; Cities and towns; Dielectric breakdown; Electric breakdown; Electrodes; Electrons; Magnetic tunneling; Stress; System testing; Threshold voltage;
Conference_Titel :
Electrical Overstress/Electrostatic Discharge Symposium, 2006. EOS/ESD '06.
Conference_Location :
Anaheim, CA
Print_ISBN :
978-1-5853-7115-0