Abstract :
A PNP-triggered SCR with improved trigger techniques is proposed for high-speed I/O ESD protection. By using these techniques, a high trigger voltage, VTRIG, for latch-up immunity during normal operating conditions, together with a low trigger voltage, Vt1, during ESD stress conditions, can be realized with simple design. Moreover, I/O circuits including the ESD protection are operable at a higher voltage than an on-chip core VDD. The PNP-triggered SCR is demonstrated in our 90 nm CMOS technology, suitable trigger voltages at both conditions (VTRIG = 4.0 V@125degC/ Vt1 = 2.0 V), and good ESD performances (HBM: 3500 V/ MM: 200 V) are achieved.
Keywords :
CMOS integrated circuits; electrostatic discharge; high-speed techniques; large scale integration; thyristors; trigger circuits; CMOS technology; ESD stress condition; PNP-triggered SCR; deep sub-micron CMOS LSIs; high-speed I-O ESD protection; size 90 nm; trigger technique; CMOS technology; Circuits; Electrostatic discharge; MOS devices; MOSFETs; Protection; Stress; Thyristors; Transmitters; Voltage;